deeptech Value proposition
Your nano-patterned solutions creator
SILSEF is a French start-up, founded in 2010, based at Archamps Technopole on the French-Swiss border near Geneva. We share a 20 000 sq ft plant with industrial wafer manufacturer Sil'tronix Silicon Technologies.
The facilities include clean rooms to provide the quality required for micro/opto-electronics and bio-medical applications. The team includes 10 highly skilled staff, mostly qualified engineers and PhDs.
Our key technology is Nano Imprint Lithography (NIL) invented in 1995 in the U.S, to reduce the size of microelectronic circuits. It is ranked among the revolutionary technologies by the MIT ("Ten Technologies That can change the world"), thanks to its generic and large variety of applications.
The invention is to replicate nanoscale designs over a wide range of materials in volume and at minor costs. Our challenge is to implement the two following options to offer tailor-made solutions :
-NIL with an etching step
-Nano Embossing Polymer (NEP)
The technology allows also double scale patterns such as macro-channels (100 μm wide) with nano-structured areas (100 nm in size).
Our skills cover the whole technology chain to meet your expectations :
-Design of patterns including simulation and modelling
-Manufacture of stamps at micro and nanoscale
-Transfer patterns on a range of materials
-Geometric and functional characterizations
It is supported by the NILAB (Nano Imprint Laboratory), a technology platform that brings together first class academic and industrial partners. Thus, in addition to its internal resources, SILSEF can call upon wide scientific and technological resources to assess your requirements and best respond to your specifications.
nano-patterning, sol-gel, and Surface modificationOriginal language
Your nano-patterned solutions creator
SILSEF is a French start-up, founded in 2010, based at Archamps Technopole on the French-Swiss border near Geneva. We share a 20 000 sq ft plant with industrial wafer manufacturer Sil'tronix Silicon Technologies.
The facilities include clean rooms to provide the quality required for micro/opto-electronics and bio-medical applications. The team includes 10 highly skilled staff, mostly qualified engineers and PhDs.
Our key technology is Nano Imprint Lithography (NIL) invented in 1995 in the U.S, to reduce the size of microelectronic circuits. It is ranked among the revolutionary technologies by the MIT ("Ten Technologies That can change the world"), thanks to its generic and large variety of applications.
The invention is to replicate nanoscale designs over a wide range of materials in volume and at minor costs. Our challenge is to implement the two following options to offer tailor-made solutions :
-NIL with an etching step
-Nano Embossing Polymer (NEP)
The technology allows also double scale patterns such as macro-channels (100 μm wide) with nano-structured areas (100 nm in size).
Our skills cover the whole technology chain to meet your expectations :
-Design of patterns including simulation and modelling
-Manufacture of stamps at micro and nanoscale
-Transfer patterns on a range of materials
-Geometric and functional characterizations
It is supported by the NILAB (Nano Imprint Laboratory), a technology platform that brings together first class academic and industrial partners. Thus, in addition to its internal resources, SILSEF can call upon wide scientific and technological resources to assess your requirements and best respond to your specifications.
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